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  • Commodity Name: Various metal and alloy sputtering target
  • Commodity Numbers: GCXT04
  • var_product_addTime: 2011-01-10
  • Views : 524

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description:

The technique of production we adopt: metal and alloy no contamination melting, vacuum hot isostatic pressing, metal and alloy vacuum hot forging, metal and alloy vacuum hot pressing, metal and alloy precise shaping technology.

The main products include: Scandium, Yttrium, Lanthanum, Cerium, Praseodymium, Neodymium, Samarium, Gadolinium, Terbium, Dysprosium, Holmium, Erbium, Thulium, Ytterbium, Lutetium, Titanium, Zirconium, Hafnium, Vanadium, Niobium, Tantalum, Chromium, Molybdenum, Tungsten, Manganese, Iron, Cobalt, Nickel, Copper, Silver, Gold, Zinc, Aluminum, Indium, Tin and Hf-Fe, Ti-Al, Y-Zr, Ni-Ti, Ti-Zr, Al-Si, Al-Cu, W-Cu, Al-B, Al-Mn, Al-Mg, Al-Sc, Al-Nd, Ni-Zr,Ce-Al, Zr-V, Gd-Ti, Ce-Zr-Y, Gd-Fe-Co,Gd-Ti-Zr, Tb-Fe-Co, Tb-Dy-Fe, Al-Mg-Si-Mo,etc. metal, alloy and their sputtering target. Moreover,Our products have the characteristics of high purity, large size, high density, small alloy segregation.